Resolution enhancement optimization methods in optical lithography with improved manufacturability-Reference-Cited by-同舟云学术

Resolution enhancement optimization methods in optical lithography with improved manufacturability

Published:2011-04-01 Issue:2 Volume:10 Page:023009
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Ma Xu

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference33 articles.

1. A. K. Wong ,Resolution Enhancement Techniques, vol. 1, SPIE Press, Bellingham, WA (2001).

2. X. Ma and G. R. Arce , “Computational Lithography,”Wiley Series in Pure and Applied Optics, 1st ed. John Wiley and Sons, New York (2010).

3. S. A. Campbell ,The Science and Engineering of Microelectronic Fabrication, 2nd ed., Publishing House of Electronics Industry (2003).

4. Resolution enhancement technology: the past, the present, and extensions for the future

5. F. Schellenberg ,Resolution Enhancement Techniques in Optical Lithography, SPIE Press, (2004).

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