Development of ballistic hot electron emitter and its applications to parallel processing: active-matrix massive direct-write lithography in vacuum and thin-film deposition in solutions-Reference-Cited by-同舟云学术

Development of ballistic hot electron emitter and its applications to parallel processing: active-matrix massive direct-write lithography in vacuum and thin-film deposition in solutions

Published:2015-09-11 Issue:3 Volume:14 Page:031215
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Koshida Nobuyoshi¹,Kojima Akira²,Ikegami Naokatsu²,Suda Ryutaro¹,Yagi Mamiko¹,Shirakashi Junichi¹,Miyaguchi Hiroshi²,Muroyama Masanori²,Yoshida Shinya²,Totsu Kentaro²,Esashi Masayoshi²

Affiliation:

1. Tokyo University of Agriculture and Technology, Department of Electrical and Electronic Engineering, 2-24-16 Naka-cho, Koganei, Tokyo 184-8588, Japan

2. Tohoku University, Micro System Integration Center, 6-6-01 Aoba, Aramaki, Aoba-ku, Sendai, Miyagi 980-8579, Japan

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. REBL: design progress toward 16 nm half-pitch maskless projection electron beam lithography

2. Reflective electron-beam lithography: progress toward high-throughput production capability

3. 50 keV electron multibeam mask writer for the 11nm HP node: first results of the proof of concept tool (eMET POC)

4. Quasiballistic electron emission from porous silicon diodes

5. Ballistic electron emission from quantum-sized nanosilicon diode and its applications

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3. Porous Silicon Ballistic Hot Electron Emitter;Handbook of Porous Silicon;2018

4. Liquid-phase deposition of thin Si and Ge films based on ballistic hot electron incidence;Materials Science in Semiconductor Processing;2017-11

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