Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates-Reference-Cited by-同舟云学术

Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

Published:2015-11-09 Issue:4 Volume:14 Page:043506
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Del Re Ryan¹,Passarelli James¹,Sortland Miriam¹,Cardineau Brian¹,Ekinci Yasin²,Buitrago Elizabeth²,Neisser Mark³,Freedman Daniel A.⁴,Brainard Robert L.¹

Affiliation:

1. College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States

2. Paul Scherrer Institut, 5232 Villigen PSI, Switzerland

3. Sematech, Albany, New York 12203, United States

4. State University of New York at New Paltz, 1 Hawk Drive, New Paltz, New York 12561, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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