Advanced electric-field scanning probe lithography on molecular resist using active cantilever-Reference-Cited by-同舟云学术

Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Published:2015-06-10 Issue:3 Volume:14 Page:031202
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Kaestner Marcus¹,Aydogan Cemal¹,Ivanov Tzvetan¹,Ahmad Ahmad¹,Angelov Tihomir¹,Reum Alexander²,Ishchuk Valentyn¹,Krivoshapkina Yana¹,Hofer Manuel²,Lenk Steve¹,Atanasov Ivaylo²,Holz Mathias³,Rangelow Ivo W.¹

Affiliation:

1. Ilmenau University of Technology, Institute of Micro and Nanoelectronics, Department of Micro- and Nanoelectronic Systems, Faculty of Electrical Engineering and Information Technology, Gustav-Kirchhoff-Straße 1, Ilmenau 98693, Germany

2. Ilmenau University of Technology, Institute of Micro and Nanoelectronics, Department of Micro- and Nanoelectronic Systems, Faculty of Electrical Engineering and Information Technology, Gustav-Kirchhoff-Straße 1, Ilmenau 98693, GermanybNano Analytik GmbH,

3. Nano Analytik GmbH, Ehrenbergstraße 11, Ilmenau 98693, Germany

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference38 articles.

1. Nanoprobe maskless lithography

2. Scanning probe lithography approach for beyond CMOS devices

3. Extreme ultraviolet lithography: A review

4. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

5. Positioning single atoms with a scanning tunnelling microscope

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