Author:
Sun Lei,Wang Wenhui,Beique Genevieve,Wood Obert,Kim Ryoung-Han
Reference29 articles.
1. H. Levinson, [Principles of Lithography], SPIE Press, 3rd ed., (2011).
2. EUV Lithography
3. Line width roughness and its control on photomask;Wu,2013
4. A review of line edge roughness and surface nanotexture resulting from patterning processes
5. Towards an integrated Line Edge Roughness Understanding: Metrology, Characterization and Plasma Etching Transfer;Gogolides,2013
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