Application of frequency domain line edge roughness characterization methodology in lithography

Author:

Sun Lei,Wang Wenhui,Beique Genevieve,Wood Obert,Kim Ryoung-Han

Publisher

SPIE

Reference29 articles.

1. H. Levinson, [Principles of Lithography], SPIE Press, 3rd ed., (2011).

2. EUV Lithography

3. Line width roughness and its control on photomask;Wu,2013

4. A review of line edge roughness and surface nanotexture resulting from patterning processes

5. Towards an integrated Line Edge Roughness Understanding: Metrology, Characterization and Plasma Etching Transfer;Gogolides,2013

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