Physical properties of the HCT EUV source-Reference-Cited by-同舟云学术

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Physical properties of the HCT EUV source

Published:2003-06-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Pankert Joseph,Bergmann Klaus,Klein Juergen,Neff Willi,Rosier Oliver,Seiwert Stefan,Smith Christopher,Probst Sven,Vaudrevange Dominik,Siemons Guido,Apetz Rolf,Jonkers Jeroen,Loeken Michael,Bosch Eric,Derra Guenther H.,Kruecken Thomas,Zink Peter

Publisher

SPIE

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. On space charge effects in laboratory-based photoemission electron microscopy using compact gas discharge extreme ultraviolet sources;New Journal of Physics;2020-10-01

2. Towards a Carbon-contamination-tolerant EUV power sensor;Extreme Ultraviolet (EUV) Lithography VII;2016-03-18

3. Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects;Journal of Micro/Nanolithography, MEMS, and MOEMS;2012-05-21

4. Effect of Electron Density on Extreme Ultraviolet Output of a Z-Pinch Xe Discharge Produced Plasma Source;Japanese Journal of Applied Physics;2011-06-20

5. Effect of Electron Density on Extreme Ultraviolet Output of a Z-Pinch Xe Discharge Produced Plasma Source;Japanese Journal of Applied Physics;2011-06-01

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