Metrology-class EUV light source based on quasi-continuous copper LPP
Author:
Publisher
SPIE
Reference6 articles.
1. Laser produced plasma EUV sources for N5 HVM and beyond: performance, availability and technology innovation
2. Interface-engineered EUV multilayer mirrors
3. Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
4. Generation of soft X-rays and extreme ultraviolet (EUV) using a laser-irradiated gas puff target
5. Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
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