Reactive ion etching of Ta2O5/SiO2 mixed films using CHF3 and Ar-Reference-Cited by-同舟云学术

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Reactive ion etching of Ta2O5/SiO2 mixed films using CHF3 and Ar

Published:2022-03-27 Issue: Volume: Page:
ISSN:
Container-title:Eighth Symposium on Novel Photoelectronic Detection Technology and Applications
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Author:

Die Junhui,Qiao Zhao,Qiu Fumin,Pu Yunti,Lv Liang,Xiong Bingcheng,Ma Ping,Zhang Mingxiao

Publisher

SPIE

Reference16 articles.

1. Ion-beam sputtering of (Ta2O5)x− (SiO2)1−x composite thin films

2. Compositional dependence of absorption coefficient and band-gap for Nb2O5–SiO2 mixture thin films

3. Characterization of zirconia– and niobia–silica mixture coatings produced by ion-beam sputtering

4. Low-loss dielectric mirror with ion-beam-sputtered TiO_2–SiO_2 mixed films

5. Stress reduction in ion beam sputtered mixed oxide films

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