Author:
Matsunawa Tetsuaki,Yu Bei,Pan David Z.
Cited by
45 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. AdaOPC 2.0: Enhanced Adaptive Mask Optimization Framework for via Layers;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2024-09
2. 极紫外光刻中的边缘放置误差控制;Chinese Journal of Lasers;2024
3. Investigating Machine Learning Applications for FDSOI MOS-Based Computer-Aided Design;2023 9th International Conference on Signal Processing and Communication (ICSC);2023-12-21
4. AI/ML algorithms and applications in VLSI design and technology;Integration;2023-11
5. Fast mask optimization based on self-calibrated convolutions;Third International Conference on Optics and Image Processing (ICOIP 2023);2023-08-01