Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers-Reference-Cited by-同舟云学术

Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers

Published:2014-03-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Nation Benjamin D.,Peters Andrew,Lawson Richard A.,Ludovice Peter J.,Henderson Clifford L.

Publisher

SPIE

Reference22 articles.

1. Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab;Bencher,2011

2. Directed self-assembly defectivity assessment. Part II;Bencher,2012

3. Pattern scaling with directed self assembly through lithography and etch process integration;Rathsack,2012

4. All track directed self-assembly of block copolymers: process flow and origin of defects;Rincon Delgadillo,2012

5. Pattern density multiplication by direct self assembly of block copolymers: toward 300mm CMOS requirements;Tiron,2012

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1. Chemoepitaxial guiding underlayers for density asymmetric and energetically asymmetric diblock copolymers;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-11-22

2. Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-10-27

3. Chemoepitaxial guiding underlayers for density asymmetric and energetically asymmetric diblock copolymers;SPIE Proceedings;2016-04-01

4. Overview of materials and processes for lithography;Materials and Processes for Next Generation Lithography;2016

5. Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns;Alternative Lithographic Technologies VII;2015-03-19