Damage to shallown+/pandp+/njunctions by CHF3+CO2reactive ion etching
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.339949
Reference10 articles.
1. The effects of processing on radiation damage in SiO2
2. DLTS Study of RIE-Induced Deep Levels in Si Using p+n Diode Arrays
3. MOSC-tEvaluation of Reactive Ion Etched Silicon Substrate
4. Study of silicon contamination and near‐surface damage caused by CF4/H2reactive ion etching
5. Reactive Ion Etching Damage to Shallow Junctions
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