Nanometer-scale crystallization of thin HfO2 films studied by HF-chemical etching
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1939073
Reference9 articles.
1. Thermal stability and structural characteristics of HfO2 films on Si (100) grown by atomic-layer deposition
2. Effects of crystallization on the electrical properties of ultrathin HfO2 dielectrics grown by atomic layer deposition
3. Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films
4. Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition
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1. Plasma-enhanced atomic layer deposited HfO2 films using a novel heteroleptic cyclopentadienyl-based Hf precursor;Ceramics International;2021-10
2. Latent Reliability Degradation of Ultrathin Amorphous HfO2 Dielectric After Heavy Ion Irradiation: The Impact of Nano-Crystallization;IEEE Electron Device Letters;2019-10
3. Low temperature preparation of HfO2/SiO2stack structure for interface dipole modulation;Applied Physics Letters;2018-12-17
4. Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition;Journal of Materials Science;2018-02-14
5. Photoemission study on electrical dipole at SiO2/Si and HfO2/SiO2interfaces;Japanese Journal of Applied Physics;2017-03-16
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