A simple design of flat hyperlens for lithography and imaging with half-pitch resolution down to 20 nm
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3141457
Reference25 articles.
1. Evanescent interferometric lithography
2. Patterning Sub-50 nm features with near-field embedded-amplitude masks
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5. Near-field optical lithography using a planar silver lens
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