Comparison of laser‐initiated and thermal chemical vapor deposition of tungsten films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.95333
Reference12 articles.
1. Microstructure, growth, resistivity, and stresses in thin tungsten films deposited by rf sputtering
2. Structural and electrical properties of sputtered tungsten films
3. Control of Resistivity, Microstructure, and Stress in Electron Beam Evaporated Tungsten Films
4. Kinetics and properties of chemically vapour-deposited tungsten films on silicon substrates
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