Lattice relaxation of nanostructured semiconductor pillars observed by high‐resolution x‐ray diffraction
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.111213
Reference10 articles.
1. Sub‐50 nm high aspect‐ratio silicon pillars, ridges, and trenches fabricated using ultrahigh resolution electron beam lithography and reactive ion etching
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3. X-ray diffraction from corrugated crystalline surfaces and interfaces
4. Observation and analysis of quantum wire structures by high-resolution X-ray diffraction
5. X‐ray diffraction reciprocal space mapping of a GaAs surface grating
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2. Application of inline high resolution x-ray diffraction in monitoring Si/SiGe and conventional Si in SOI fin-shaped field effect transistor processes;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-07
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