High‐energy argon‐ion implantation for waveguide formation in (AlGa)As/GaAs multilayers

Author:

Myers D. R.,Lee Kyu,Hausken T.,Simes R. J.,Ribot H.,Laruelle F.,Coldren L. A.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Optical Strength Engineering;Semiconductor Laser Engineering, Reliability and Diagnostics;2013-01-24

2. Semiconductor lasers using diffused quantum-well structures;IEEE Journal of Selected Topics in Quantum Electronics;1998

3. RBS studies of the lattice damage caused by 1 Me V Si+ implantation into Al0.3Ga0.7As/GaAs superlattices at elevated temperature;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1994-05

4. Rapid-thermal annealing for quantum-well heterostructure device fabrication;IEEE Transactions on Electron Devices;1992

5. Issues in the realization of strained-layer quantum well optoelectronic devices;Optical and Quantum Electronics;1991

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