Phase transformation of titanium silicide as measured by ellipsometry
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.351794
Reference11 articles.
1. Influence of grain size on the transformation temperature of C49 TiSi2to C54 TiSi2
2. Metastable phase formation in titanium‐silicon thin films
3. Thin film interaction between titanium and polycrystalline silicon
4. Solid state reactions in titanium thin films on silicon
5. Crystallization of amorphous Ti‐Si alloy thin films: Microstructure and resistivity
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The Effects of Implanted Arsenic on Ti-Silicide Formation;Solid State Phenomena;1999-10
2. Non-Destructive Investigations of Co and CoSi2-x Films on Si Substrate;Solid State Phenomena;1998-12
3. Characterization of the interfaces formed during the silicidation process of Ti films on Si at low and high temperatures;Surface and Interface Analysis;1997-10
4. Influence of the initial nitrogen content in titanium films on the nitridation and silicidation processes;Thin Solid Films;1997-08
5. A kinetic study of the C49 to C54 TiSi2conversion using electrical resistivity measurements on single narrow lines;Journal of Applied Physics;1995-12-15
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