High temperature operation of InGaAsP/InP heterostructure lasers and integrated back facet monitors fabricated by chemically assisted ion beam etching
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.109327
Reference11 articles.
1. Low threshold GaAs/GaAlAs BH lasers with ion-beam-etched mirrors
2. Full-wafer technology for large-scale laser processing and testing
3. GaInAsP/InP stripe‐geometry laser with a reactive‐ion‐etched facet
4. High-performance InGaAsP/InP 1.3 μm laser structures with both facets etched
5. Continuous operation of monolithic dynamic‐single‐mode coupled‐cavity lasers
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1. Transfer printing of fully formed thin-film microscale GaAs lasers on silicon with a thermally conductive interface material;Laser & Photonics Reviews;2015-05-29
2. Structural, optical and electronic subband studies of lattice-matched In0.72Ga0.28As0.61P0.39/InP multiple quantum wells;Applied Surface Science;1999-03
3. Inductively Coupled Plasma and Electron Cyclotron Resonance Plasma Etching of an InGaAlP Compound Semiconductor System;Critical Reviews in Solid State and Materials Sciences;1998-12
4. The application of high density plasma sources for optoelectronic devicefabrication;Vacuum;1998-12
5. Sidewall slope control of chemically assisted ion-beam etched structures in InP-based materials;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-07
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