Production of fluorine 2,4P→2P0 resonance radiation by electron impact on SF6, CF4, NF3, and CCl2F2
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.460348
Reference35 articles.
1. The design of plasma etchants
2. Plasma-assisted etching
3. Nonlinear excitation and dissociation kinetics in discharges through mixtures of rare and attaching gases
4. On the excitation of CCl(A 2δ) in CCl4 and CCl4/rare gas discharges
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2. Analysis of Excitation and Ionization of Atoms and Molecules by Electron Impact;Springer Series on Atomic, Optical, and Plasma Physics;2011
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