The fabrication of nanomesas and nanometal contacts by using atomic force microscopy lithography
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3504654
Reference16 articles.
1. Fabrication of 0.1 μm metal oxide semiconductor field‐effect transistors with the atomic force microscope
2. Nanomachining of mesoscopic electronic devices using an atomic force microscope
3. Fabrication of a single-electron transistor by current-controlled local oxidation of a two-dimensional electron system
4. In-plane gates and nanostructures fabricated by direct oxidation of semiconductor heterostructures with an atomic force microscope
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Nanoscaled Profiling of Silicon Surface via Local Anodic Oxidation;Russian Microelectronics;2019-03
2. A Study of Nanoscale Profiling Modes of a Silicon Surface via Local Anodic Oxidation;Nanotechnologies in Russia;2018-01
3. In-Plane Gate Transistors for Photodetector Applications;IEEE Electron Device Letters;2013-06
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