Annealing of plasma silicon oxynitride films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.337118
Reference15 articles.
1. Plasma‐enhanced growth and composition of silicon oxynitride films
2. Thermal stresses and cracking resistance of dielectric films (SiN, Si3N4, and SiO2) on Si substrates
3. Properties of Plasma‐Deposited Silicon Nitride
4. Hydrogen bonding configurations in silicon nitride films prepared by plasma‐enhanced deposition
5. Hydrogen evolution and defect creation in amorphous Si: H alloys
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