Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1891290
Reference8 articles.
1. Raman characterization of germanium nanocrystals in amorphous silicon oxide films synthesized by rapid thermal annealing
2. Microstructural and photoluminescence studies of germanium nanocrystals in amorphous silicon oxide films
3. Instability of a GexSi1−xO2film on a GexSi1−xlayer
4. Nanocrystalline germanium synthesis from hydrothermally oxidized Si1−xGexalloys
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4. Effect of Ge Concentration on the Microstructure of Germanium Nanocrystals Produced by Ion Implantation in SiO2;Journal of Nanoscience and Nanotechnology;2017-03-01
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