Reduction in leakage current through interface between Ga2O3 epitaxial layer and substrate by ion implantation doping of compensating impurities

Author:

Kumar Sandeep1ORCID,Kamimura Takafumi1ORCID,Lin Chia-Hung1ORCID,Nakata Yoshiaki1,Higashiwaki Masataka1ORCID

Affiliation:

1. National Institute of Information and Communications Technology, Koganei, Tokyo 184-8795, Japan

Funder

Ministry of Internal Affairs and Communications

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Reference37 articles.

1. 2300V Reverse Breakdown Voltage Ga2O3Schottky Rectifiers

2. W. Li , Z. Hu , K. Nomoto , R. Jinno , Z. Zhang , T. Q. Tu , K. Sasaki , A. Kuramata , D. Jena , and H. G. Xing , in Proceedings of the 2018 IEEE International Electron Devices Meeting (IEDM) (2018), pp. 8.5.1–8.5.4.

3. Vertical Ga2O3 Schottky Barrier Diodes With Guard Ring Formed by Nitrogen-Ion Implantation

4. W. Li , K. Nomoto , Z. Hu , T. Nakamura , D. Jena , and H. G. Xing , in Proc. of 2019 IEEE International Electron Devices Meeting (IEDM) (2019) pp. 12.4.1–12.4.4.

5. Enhancement-Mode $\beta$ -Ga2O3 Current Aperture Vertical MOSFETs With N-Ion-Implanted Blocker

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