Thermal stability of low dielectric constant porous silica films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2159093
Reference10 articles.
1. Low dielectric constant materials for microelectronics
2. Low dielectric constant films prepared by plasma-enhanced chemical vapor deposition from tetramethylsilane
3. Origin of low dielectric constant of carbon-incorporated silicon oxide film deposited by plasma enhanced chemical vapor deposition
4. Porosity in low dielectric constant SiOCH films depth profiled by positron annihilation spectroscopy
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Reduced contact resistance in organic field-effect transistors fabricated using floating film transfer method;Journal of Materials Science: Materials in Electronics;2020-08-02
2. Impact of gamma rays on physical properties of chromium oxide thin films;Radiation Physics and Chemistry;2020-05
3. Frequency independent low-k lithium borate nanocrystalline glass ceramic and glasses for microelectronic applications;Journal of Materials Chemistry C;2016
4. On the effects of thermal treatment on the composition, structure, morphology, and optical properties of hydrogenated amorphous silicon-oxycarbide;Journal of Materials Research;2009-08
5. Low-Voltage Organic Field-Effect Transistor With PMMA/$ \hbox{ZrO}_{2}$ Bilayer Dielectric;IEEE Transactions on Electron Devices;2009-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3