Quantum cascade laser based monitoring of CF2 radical concentration as a diagnostic tool of dielectric etching plasma processes-Reference-Cited by-同舟云学术

Quantum cascade laser based monitoring of CF2 radical concentration as a diagnostic tool of dielectric etching plasma processes

Author:

Hübner M.¹,Lang N.¹^ORCID,Zimmermann S.²,Schulz S. E.²,Buchholtz W.³,Röpcke J.¹,van Helden J. H.¹

Affiliation:

1. Leibniz Institute for Plasma Science and Technology (INP Greifswald), Felix-Hausdorff Str. 2, 17489 Greifswald, Germany

2. Fraunhofer Institute for Electronic Nano Systems, Technologie-Campus 3, 09126 Chemnitz, Germany

3. GLOBALFOUNDRIES Dresden Module One LLC & Co. KG, Wilschdorfer Landstr. 101, 01109 Dresden, Germany

Funder

Free State of Saxony, Germany

Technology funding for regional development (ERDF) of the European Union

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

Reference26 articles.

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