Lateral length scales of latent image roughness as determined by off-specular neutron reflectivity
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2841663
Reference24 articles.
1. Process dependence of roughness in a positive-tone chemically amplified resist
2. Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance
3. Line edge roughness and intrinsic bias for two methacrylate polymer resist systems
4. Resist line edge roughness and aerial image contrast
5. Factors contributing to sidewall roughness in a positive-tone, chemically amplified resist exposed by x-ray lithography
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1. Aqueous developable dual switching photoresists for nanolithography;Journal of Polymer Science Part A: Polymer Chemistry;2012-07-16
2. Applications of Neutron Reflectivity in Bioelectrochemistry;Advances in Electrochemical Sciences and Engineering;2012-02-08
3. Polymer Interfaces and thin Films;Neutrons in Soft Matter;2011-05-11
4. Lateral uniformity in chemical composition along a buried reaction front in polymers using off-specular reflectivity;Journal of Physics: Condensed Matter;2010-11-15
5. Photoresist Latent and Developer Images as Probed by Neutron Reflectivity Methods;Advanced Materials;2010-09-16
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