Elongation of extreme ultraviolet (at 13.5 nm) emission with time-of-flight controlled discharges and lateral fuel injection
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2975211
Reference22 articles.
1. Optical Lithography Goes to Extremes--And Beyond
2. Efficient soft x-ray emission source at 13.5 nm by use of a femtosecond-laser-produced Li-based microplasma
3. Efficient extreme ultraviolet plasma source generated by a CO2 laser and a liquid xenon microjet target
4. Enhancement of extreme ultraviolet emission from a lithium plasma by use of dual laser pulses
5. Low-debris, efficient laser-produced plasma extreme ultraviolet source by use of a regenerative liquid microjet target containing tin dioxide (SnO2) nanoparticles
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1. Effect of Time Delay on Laser-Triggered Discharge Plasma for a Beyond EUV Source;Symmetry;2019-05-11
2. Effect of Plasma Density on Discharge Produced Plasma Extreme Ultraviolet Source;SPECTROSC SPECT ANAL;2017
3. Laser-Assisted Counter-Facing Plasma Focus Device as a Light Source for EUV Lithography;IEEE Transactions on Plasma Science;2017-05
4. Electrical Recovery After Laser-Assisted Discharge for Highly Repetitive Plasma EUV Source;IEEE Transactions on Plasma Science;2011-09
5. Counter-facing plasma focus system as an efficient and long-pulse EUV light source;SPIE Proceedings;2011-03-17
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