Design of a compact ultrahigh vacuum-compatible setup for the analysis of chemical vapor deposition processes
Author:
Affiliation:
1. Institut für Angewandte und Physikalische Chemie, Universität Bremen, Leobener Straße UFT, D-28359 Bremen, Germany
2. Physikalische Chemie I, Fakultät für Chemie, Universität Bielefeld, Universitätsstraße 25, D-33615 Bielefeld, Germany
Funder
Deutsche Forschungsgemeinschaft (DFG)
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4897620
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4. Volatile CVD precursor for Ni film: cyclopentadienylallylnickel
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