Catalystlike behavior of Si adatoms in the growth of monolayer Al film on Si(111)-Reference-Cited by-同舟云学术

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Catalystlike behavior of Si adatoms in the growth of monolayer Al film on Si(111)

Published:2010-07-07 Issue:1 Volume:133 Page:014704
ISSN:0021-9606
Container-title:The Journal of Chemical Physics
language:en
Short-container-title:The Journal of Chemical Physics

Author:

Teng Jing,Zhang Lixin,Jiang Ying,Guo Jiandong,Guo Qinlin,Wang Enge,Ebert Philipp,Sakurai T.,Wu Kehui

Publisher

AIP Publishing

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3455231

Reference23 articles.

1. Nanostructured surfaces: challenges and frontiers in nanotechnology

2. Engineering atomic and molecular nanostructures at surfaces

3. A theory of thin metal films: electron density, potentials and work function

4. “Electronic Growth” of Metallic Overlayers on Semiconductor Substrates

5. Quantum-Well States as Fabry-Pérot Modes in a Thin-Film Electron Interferometer

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Extra metal adatom surface diffusion simulation on 1/3 ML Si(111) $\sqrt {3}\times \sqrt {3}$ metal-induced surfaces;Physica Scripta;2013-08-22

2. Quantum Confinement Drives Macroscopic Stress Oscillations at the Initial Stage of Thin Film Growth;Physical Review Letters;2012-07-27

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