Texturization of polycrystalline silicon films using excimer‐laser processing for memory device applications
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.107284
Reference9 articles.
1. New stacked capacitor structure using hemispherical‐grain polycrystalline‐silicon electrodes
2. Thin nitride films on textured polysilicon to increase multimegabit DRAM cell charge capacity
3. Crystallographic orientation of silicon on an amorphous substrate using an artificial surface‐relief grating and laser crystallization
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3. Improvements of laser weldability of aluminum alloys by laser texturization;AIP Conference Proceedings;2012
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