Writing self-assembled monolayers with Cs: Optimization of atomic nanolithography imaging using self-assembled monolayers on gold substrates
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1921342
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1. Using light as a lens for submicron, neutral-atom lithography
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1. Formation of Ordered Two-Dimensional Polymer Latticeworks With Polygonal Meshes by Self-Organized Anisotropic Mass Transfer;Macromolecular Chemistry and Physics;2008-02-05
2. In-situ examination of the selective etching of an alkanethiol monolayer covered Au{111} surface;Materials Letters;2007-07
3. Resource Letter AON-1: Atom optics, a tool for nanofabrication;American Journal of Physics;2007-05
4. Photopatterning of an Organic Monolayer Formed on a Si Single Crystal Surface via Si–C Covalent Bond by UV Irradiation in an Inert Atmosphere;Japanese Journal of Applied Physics;2006-11-08
5. Atomic nanolithography patterning of submicron features: writing an organic self-assembled monolayer with cold, bright Cs atom beams;Nanotechnology;2005-06-29
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