Wet chemical cleaning of InP surfaces investigated byin situandex situinfrared spectroscopy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1596719
Reference35 articles.
1. Interface properties and capacitance‐voltage behavior of indium phosphide metal‐insulator‐semiconductor prepared by plasma‐assisted oxidation
2. Magnetically Excited Plasma Oxidation of InP: Effects of Ar Mixing and Substrate Heating
3. Influence of humidity and hydrogen on the charge transport in p-InP diode structures with a palladium contact
4. High-barrier Pt/Al/n-InP diode
5. Study of the H2 remote plasma cleaning of InP substrate for epitaxial growth
Cited by 42 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. (Photo-)electrochemical reactions on semiconductor surfaces, part B: III-V surfaces–atomic and electronic structure;Encyclopedia of Solid-Liquid Interfaces;2024
2. Surface evolution of InP substrates at the frontier between deoxidation and dissolution in HCl solutions;Surface and Interface Analysis;2022-09-17
3. Bifunctional Metal Oleate as an Alternative Method to Remove Surface Oxide and Passivate Surface Defects of Aminophosphine-Based InP Quantum Dots;Nanomaterials;2022-02-08
4. How to Use Localized Surface Plasmon for Monitoring the Adsorption of Thiol Molecules on Gold Nanoparticles?;Nanomaterials;2022-01-17
5. Encapsulation study of MOVPE grown InAs QDs by InP towards 1550 nm emission;Journal of Crystal Growth;2021-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3