A comprehensive simulation model of the performance of photochromic films in absorbance-modulation-optical-lithography
Author:
Affiliation:
1. Department of Electrical and Computer Engineering, University of Utah, Salt Lake City, Utah 84112, USA
2. Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA
Funder
National Science Foundation (NSF)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4944489
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