Hysteresis-free and μs-switching of D/E-modes Ga2O3 hetero-junction FETs with the BV2/Ron,sp of 0.74/0.28 GW/cm2

Author:

Wang Chenlu1ORCID,Zhou Hong1ORCID,Zhang Jincheng1,Mu Wenxiang2,Wei Jie3,Jia Zhitai2ORCID,Zheng Xuefeng1ORCID,Luo Xiaorong3,Tao Xutang2ORCID,Hao Yue1

Affiliation:

1. State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071, China

2. State Key Laboratory of Crystal Materials, Institute of Crystal Materials, Shandong University, Jinan 250100, China

3. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China

Abstract

In this Letter, we report on establishing high performance hysteresis-free and μs-switching depletion/enhancement-mode (D/E-mode) β-Ga2O3 heterojunction (HJ) field effect transistors (FETs) with the state-of-art power figure-of-merit (P-FOM). By optimizing the p-NiOx/n-Ga2O3 interface and n-Ga2O3 recess technology, a positive threshold voltage (VT) as well as a low subthreshold slope can be substantially achieved. The trade-off between the on-resistance (Ron,sp) and breakdown voltage (BV) is improved by incorporation of T-shaped NiOx, resulting in the Ron,sp of 6.24/13.75 mΩ cm2 and the breakdown voltage (BV) of 2145/1977 V for D/E-mode devices and yielding the P-FOM = BV2/Ron,sp to be 0.74/0.28 GW/cm2. To the best of all the authors' knowledge, those P-FOMs are the highest ones among all published lateral Ga2O3 FETs. Benefited from the high-quality interface, a negligible hysteresis of 4 mV and μs-switching can be essentially achieved, showing the great promise of Ga2O3 HJ-FETs for future high-power, high-efficiency, and high-speed power electronics.

Funder

National Natural Science Foundation of China

Natural Science Foundation of Shandong Province

Natural Science Foundation of Shaanxi Provincial Department of Education

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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