Interfacial reaction of Ta and Si rich tantalum silicides with Si substrate
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.347112
Reference18 articles.
1. Refractory metal silicides: Thin-film properties and processing technology
2. Stresses in TaSixfilms sputter deposited on polycrystalline silicon
3. Refractory silicides of titanium and tantalum for low-resistivity gates and interconnects
4. Oxidation of tantalum disilicide on polycrystalline silicon
5. Composite TaSi2/n+poly-Si formation by rapid thermal annealing
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