Ablation and etching of polymethylmethacrylate by very short (160 fs) ultraviolet (308 nm) laser pulses
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.99001
Reference7 articles.
1. 160-fsec XeCl excimer amplifier system
2. Dynamics of UV laser ablation of organic polymer surfaces
3. Pulsed CO2laser etching of polyimide
4. Time resolved transmission studies of poly(methyl methacrylate) films during ultraviolet laser ablative photodecomposition
5. Time resolved transmission studies of poly(methyl methacrylate) films during ultraviolet laser ablative photodecomposition
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