CO2laser‐induced chemical vapor deposition of titanium silicide films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96097
Reference8 articles.
1. Low pressure chemical vapor deposition of titanium silicide
2. Properties of Molybdenum Silicide Film Deposited by Chemical Vapor Deposition
3. Plasma-enhanced CVD of titanium silicide
4. Ion-cleaning damage in (100) GaAs, and its effect on schottky diodes
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1. Laser chemical vapour deposition: materials, modelling, and process control;International Materials Reviews;2001-06
2. Laser assisted surface coatings;Metallurgical and Ceramic Protective Coatings;1996
3. Laser-assisted chemical vapour deposition of TiSi2: aspects of deposition and etching;Le Journal de Physique IV;1993-08
4. Laser synthesis of thin films of metal silicides;Thin Solid Films;1992-10
5. Laser-assisted chemical vapor deposition of hard and refractory binary compounds;Surface and Coatings Technology;1991-12
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