Correlation of nanochemistry and electrical properties in HfO2 films grown by metalorganic molecular-beam epitaxy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1873049
Reference15 articles.
1. Trap-assisted tunneling in high permittivity gate dielectric stacks
2. Structure and stability of ultrathin zirconium oxide layers on Si(001)
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4. Thermal stability and structural characteristics of HfO2 films on Si (100) grown by atomic-layer deposition
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