Studies of atomic oxygen in O2+CF4 rf discharges by two‐photon laser‐induced fluorescence and optical emission spectroscopy
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.450339
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4. Anisotropic etching of SiO2in low‐frequency CF4/O2and NF3/Ar plasmas
5. Crystallographic etching of GaAs with bromine and chlorine plasmas
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