Multi-technique Approach for the Evaluation of the Crystalline Phase of Ultrathin High-k Gate Oxide Films-Reference-Cited by-同舟云学术

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Multi-technique Approach for the Evaluation of the Crystalline Phase of Ultrathin High-k Gate Oxide Films

Published:2011 Issue: Volume: Page:
ISSN:0094-243X
Container-title:AIP Conference Proceedings
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Author:

Bersch E.,LaRose J. D.,Wells I.,Consiglio S.,Clark R. D.,Leusink G. J.,Matyi R. J.,Diebold A. C.,Seiler David G.,Diebold Alain C.,McDonald Robert,Chabli Amal,Secula Erik M.

Funder

U.S. Department of Energy

Publisher

AIP

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoscale characterization and metrology;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-09

2. Multi-technique x-ray and optical characterization of crystalline phase, texture, and electronic structure of atomic layer deposited Hf1−xZrxO2 gate dielectrics deposited by a cyclical deposition and annealing scheme;Journal of Applied Physics;2013-06-21

3. Immobilization Mechanisms of Deoxyribonucleic Acid (DNA) to Hafnium Dioxide (HfO2) Surfaces for Biosensing Applications;ACS Applied Materials & Interfaces;2012-09-21

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