Fluorine‐enhanced thermal oxidation of silicon in the presence of NF3
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.95131
Reference7 articles.
1. The Effect of HCl and Cl[sub 2] on the Thermal Oxidation of Silicon
2. Kinetics of Thermal Growth of HCl-0[sub 2] Oxides on Silicon
3. Fluorine‐enhanced plasma growth of native layers on silicon
4. Heating silicon dioxide at 950–1050 °C in the presence of an NH3+CF4 plasma
5. Quantitative chemical analysis by ESCA
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