Tantalum nitride films as resistors on chemical vapor deposited diamond substrates
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.353747
Reference10 articles.
1. GaAs monolithic devices: The role of plasma and ion beam techniques in circuit fabrication
2. Ti/Pt/AuSn metallization scheme for bonding of InP-based laser diodes to chemical vapor deposited diamond submounts
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3. Fabrication of superconducting tantalum nitride thin films using infrared pulsed laser deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-11
4. Electrical Resistivities and TCR Behavior of Co-Sputtered TaN-(Ag, Cu) Nanocomposites;Journal of the Korean Physical Society;2009-06-15
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