Absolute evaluation of out-of-band radiation from laser-produced tin plasmas for extreme ultraviolet lithography-Reference-Cited by-同舟云学术

Absolute evaluation of out-of-band radiation from laser-produced tin plasmas for extreme ultraviolet lithography

Published:2008-03-17 Issue:11 Volume:92 Page:111503
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Sakaguchi Hirokazu,Fujioka Shinsuke,Namba Shinichi,Tanuma Hajime,Ohashi Hayato,Suda Shintaro,Shimomura Masashi,Nakai Yuki,Kimura Yasuko,Yasuda Yuzuri,Nishimura Hiroaki,Norimatsu Takayoshi,Sunahara Atsushi,Nishihara Katsunobu,Miyanaga Noriaki,Izawa Yasukazu,Mima Kunioki

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2901875

Reference17 articles.

1. EUV Source Technology: Challenges and Status

2. Front-end design issues in soft-x-ray projection lithography

3. Conversion efficiencies from laser‐produced plasmas in the extreme ultraviolet regime

4. Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas

5. Ultimate Efficiency of Extreme Ultraviolet Radiation from a Laser-Produced Plasma

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