Improved characteristics of GaAs metal‐semiconductor field‐effect transistors on Si substrates back‐coated with SiO2by metalorganic chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.104331
Reference7 articles.
1. Low‐threshold continuous‐wave room‐temperature operation of AlxGa1−xAs/GaAs single quantum well lasers grown by metalorganic chemical vapor deposition on Si substrates with SiO2back coating
2. Room-Temperature CW Operation of AlGaAs/GaAs SQW Lasers on Si Substrates by MOCVD Using AlGaAs/AlGaP Intermediate Layers
3. Fabrication of GaAs MESFET Ring Oscillator on MOCVD Grown GaAs/Si(100) Substrate
4. Characteristics of all-OMCVD Grown GaAs MESFETS on Si Substrates
5. GaAs E/D MESFET 1-kbit static RAM fabricated on silicon substrate
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1. GaN MESFETs on (111) Si substrate grown by MOCVD;Electronics Letters;2000
2. Quality-enhanced GaAs layers grown on substrates by metalorganic chemical vapor deposition;Journal of Crystal Growth;1997-08
3. Performance of InGaAs metal-semiconductor-metal photodetectors on Si;IEEE Photonics Technology Letters;1996-05
4. The distribution of charge concentration in InP/Si;Journal of Applied Physics;1995-07
5. Influences of Dark Line Defects on Characteristics of AlGaAs/GaAs Quantum Well Lasers Grown on Si Substrates;Japanese Journal of Applied Physics;1995-06-15
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