Reactive HiPIMS deposition of SiO2/Ta2O5 optical interference filters-Reference-Cited by-同舟云学术

Reactive HiPIMS deposition of SiO2/Ta2O5 optical interference filters

Published:2014-12-07 Issue:21 Volume:116 Page:213302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Hála Matěj¹,Vernhes Richard¹,Zabeida Oleg¹,Klemberg-Sapieha Jolanta-Ewa¹,Martinu Ludvik¹

Affiliation:

1. Department of Engineering Physics, Thin Film Research Center–GCM, Polytechnique Montréal, P.O. Box 6079, Station Centre-Ville, Montréal, Québec H3C 3A7, Canada

Funder

Canadian Network for Research and Innovation in Machining Technology, Natural Sciences and Engineering Research Council of Canada (NSERC Canadian Network for Research and Innovation in Machining Technology)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4903285

Reference51 articles.

1. Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets

2. A novel pulsed magnetron sputter technique utilizing very high target power densities

3. High power impulse magnetron sputtering discharge

4. An introduction to thin film processing using high-power impulse magnetron sputtering

5. A. P. Ehiasarian , in Plasma Surface Engineering Research and its Practical Applications, edited by R. Wei ( Research Signpost, Kerala, India, 2008), pp. 35–85.

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