Polarization switching pathways of ferroelectric Zr-doped HfO2 based on the first-principles calculation

Author:

Dou Xiaoyu1ORCID,Wei Wei2ORCID,Sang Pengpeng1ORCID,Tai Lu1ORCID,Li Xiaopeng1,Zhan Xuepeng1,Wu Jixuan1ORCID,Chen Jiezhi1ORCID

Affiliation:

1. School of Information Science and Engineering, Shandong University 1 , Qingdao 266237, China

2. Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences 2 , Beijing 100029, China

Abstract

Based on the first principles calculation, the mechanisms of polarization switching behavior in ferroelectric Zr-doped HfO2 are investigated. Seven switching pathways, divided into two categories by the identified orientation of polarization switching and value, are analyzed based on atomic migration and energy barrier. The effects of Zr dopant on switching energy barrier (Eb) and spontaneous polarization (Ps) are analyzed as well. In one of the categories, two pathways with tetragonal-like transition states show low energy barriers and can be further minimized with higher Zr dopant proportion, which originates from the stabilizing effect of Zr dopant on the tetragonal phase (T, P42/nmc). Especially, in the two tetragonal-like pathways, a distorted tetragonal-like transient state (T′, Pbcn) resulting from distinct atomic displacement is transformed to a highly symmetric T-phase along with the incorporation of Zr, elucidating this pathway as energy favorable as the regular T-pathway. This work provides an atomic insight for ferroelectric switching behavior and predicts the probable ferroelectric switching pathway in Zr-doped HfO2 films.

Funder

China Postdoctoral Science Foundation

National Natural Science Foundation of China

TaiShan Scholars

Program of Qilu Young Scholars of Shandong University

China Key Research and Development Program under Grant

Nationally Funded Postdoctoral Researcher Program

Natural Science Foundation of Shandong Province

Publisher

AIP Publishing

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