Fluid modeling of plasma dynamics in pulsed RF capacitive glow discharges in low pressure argon
Author:
Funder
Chongqing Municipal Education Commission Science and Technology Research Projects
National Natural Science Foundation of China (NSFC)
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4997615
Reference33 articles.
1. Effects of pulse bias on structure and properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition
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4. Overview of atomic layer etching in the semiconductor industry
5. Using an afterglow plasma to modify polystyrene surfaces in pulsed radio frequency (RF) argon discharges
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