Evidence for electron‐induced x‐ray emission in sputtering deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.97110
Reference2 articles.
1. Advances in Low-Energy Electron-Induced X-ray Spectroscopy (LEEIXS)
2. ANALYTICAL CHEMISTRY and the MICROCHIP
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Monitoring of the aluminum nitride sputtering deposition by soft x‐ray emission spectroscopy;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1992-07
2. In situ chemical analysis in thin film production using soft x‐ray emission spectroscopy;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1991-05
3. Characterization and production monitoring of thin films using soft X-ray spectroscopy;Surface and Coatings Technology;1990-12
4. Monitoring of thin film sputtering by soft X-ray emission spectroscopy;Vacuum;1990-01
5. CHARACTERIZATION AND PRODUCTION MONITORING OF THIN FILMS USING SOFT X-RAY SPECTROSCOPY **Winner of a 1990 ICMC/ICTF Bunshah Award.;Metallurgical Coatings and Thin Films 1990;1990
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