Effect of thermal oxidation on helium implanted 316L stainless steel

Author:

Hong Minsung1ORCID,Morales Angelica Lopez2ORCID,Chan Ho Lun3,Macdonald Digby D.1,Balooch Mehdi1,Xie Yujun1ORCID,Romanovskaia Elena3,Scully John R.3,Kaoumi Djamel2,Hosemann Peter1ORCID

Affiliation:

1. Department of Nuclear Engineering, University of California at Berkeley, Berkeley, California 94720, USA

2. Department of Nuclear Engineering, North Carolina State University, Raleigh, North Carolina 27607, USA

3. Center of Electrochemical Science and Engineering, University of Virginia, Charlottesville, Virginia 22903, USA

Abstract

The effect of thermal oxide layer on He implanted 316L stainless steel was studied to evaluate experimentally how thermal oxidation affects the diffusion and distribution of He in the material. In the case of thermal oxidation of a He implanted sample, with an increase in oxidation time, the max swelling height increases logarithmically as a function of time and finally saturates for all samples except for the lowest dose of implanted He. Concerning TEM results, two void regions are identified. Similar to the calculation, the total irradiated depth was around 250 nm and the large void region was formed around 100–150 nm depth. On the other hand, the small void region was observed immediately under oxide layer from the thermal oxidation. In contrast, there were no voids in the altered zone near the metal/oxide interface in the non-thermal oxidized/He implanted sample. This description of the phenomena was justified using the Kirkendall effect and the Point Defect Model.

Funder

U.S. Department of Energy

Publisher

AIP Publishing

Subject

General Physics and Astronomy

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3