Atomistic study of the dissolution of small boron interstitial clusters in c-Si
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2130385
Reference19 articles.
1. Dissolution kinetics of boron-interstitial clusters in silicon
2. Kinetics of boron reactivation in doped silicon from Hall effect and spreading resistance techniques
3. Ab initio modeling of boron clustering in silicon
4. Identification of stable boron clusters in c-Si using tight-binding statics
5. Ab initio energetics of boron-interstitial clusters in crystalline Si
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